http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2019091020-A

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filingDate 2018-10-19-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_6f5e4ae08c67473d636a0530bc241a55
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publicationDate 2019-06-13-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber JP-2019091020-A
titleOfInvention Photosensitive resin composition and cured film prepared therefrom
abstract The present invention provides a cured film excellent in transparency, sensitivity, chemical resistance, and adhesion when immersed in a peeling solution. By including a hydrophilic additive, the penetration of a developing solution is promoted and the sensitivity is improved. The additive comprises an epoxy group, and the epoxy group of the additive combines with silanol groups in the siloxane polymer to improve the chemical resistance of the resin composition. Since the isocyanurate group and the ester group are contained, the chemical resistance is improved along with the effect of maintaining good adhesion to the metal even when immersed in the peeling solution. [Selected figure] Figure 1
isCitedBy http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2021070919-A1
priorityDate 2017-11-16-04:00^^<http://www.w3.org/2001/XMLSchema#date>
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Total number of triples: 31.