| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_ef6afd894cd98832773642b0e1b5286e |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C25F3-16
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C25F3-24
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C25F3-20
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C25F3-18
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C25F3-00 |
| filingDate |
2017-11-15-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_010018e7e5b957ccfafb797ec1709951
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_b8c99bb3241ddefe71bce4773429b790
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_ba56fa98d80ec3851bcb9100599eb257 |
| publicationDate |
2019-06-13-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
JP-2019090085-A |
| titleOfInvention |
Electrolytic polishing liquid and method of manufacturing working metal |
| abstract |
To provide an electropolishing liquid substantially free of phosphorus and nitrogen. An electrolytic polishing solution for metal, comprising at least the following components (1) to (2): (1) at least one inorganic sulfonic acid or organic sulfonic acid or a salt thereof; (2) At least one monohydric or polyhydric alcohol The electropolishing liquid is substantially free of nitrogen and phosphorus, Electropolishing liquid whose pH is less than 2. [Selected figure] None |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-7029742-B1 |
| priorityDate |
2017-11-15-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |