| abstract |
The present invention provides a silicon-containing underlayer which can be removed by wet stripping and is more resistant to the degradation of photoresist patterns. Electrons are produced using a wet-peelable underlayer composition comprising, as polymerized units, a condensate and / or a hydrolyzate of a polymer comprising one or more first unsaturated monomers having a condensable silicon-containing moiety. A method of manufacturing a device, wherein a condensable silicon-containing moiety is pendant attached to a polymer backbone to provide one or more condensable silicon monomers. 【Selection chart】 None |