| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_24aca9ded2638ea793d05360dde7a4a0 |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07C2603-74
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07C2602-42 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-20
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-168
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-26
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-40
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07D339-08
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0397
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0392
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07D317-72
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07D319-08
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07C309-19
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07C309-17
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0045
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07C381-12 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C07C381-12
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-20
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-038
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C07D327-06
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C07D319-08
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09K3-00 |
| filingDate |
2018-09-21-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_c2a9aacf507db12b95a8f92ddad3e63f
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_153d9ab45d90d19234e4e5282fb77563
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_a144f3526dc1d67cb5c2c69f8714bf36 |
| publicationDate |
2019-05-16-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
JP-2019073499-A |
| titleOfInvention |
Salt, acid generator, resist composition and method for producing resist pattern |
| abstract |
The present invention provides a salt capable of producing a resist pattern with a good mask error factor (MEF) and a resist composition containing the salt. A salt having a group represented by the following formula (aa): [X a and X b are each independently O or S; X 1 is a saturated hydrocarbon group having 1 to 12 carbon atoms having a group represented by the following formula (2a), etc .; * is a bond. ] [R aa1 ' and R aa 2' are each independently H or an alkyl group having 1 to 8 carbon atoms, etc .; R aa 3 ' is an alkyl having 1 to 8 carbon atoms whose methylene moiety may be substituted with O or S Group; X a is O or S; * is a bond. ] 【Selection chart】 None |
| priorityDate |
2017-10-17-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |