abstract |
The present invention provides a polymer compound useful for a resist composition, a monomer thereof, and a resist composition containing the polymer compound. A resist composition comprising a resin component having a structural unit derived from a compound represented by formula (a0-1) is employed. In the formula, W is a polymerizable group-containing group. Ra 01 is an aromatic heterocyclic group containing an oxygen atom or a sulfur atom, or an alkyl group. When Ra 01 is the aromatic heterocyclic group, Ra 02 is a group which forms an aliphatic cyclic group together with a tertiary carbon atom ( * C) to which Ra 01 is bonded, and the above aliphatic cyclic group The group comprises an electron withdrawing group. When Ra 01 is an alkyl group, Ra 02 is a group in which an aliphatic cyclic group and an aromatic heterocyclic group containing an oxygen atom or a sulfur atom form a fused ring, and a tertiary of which Ra 01 is bonded The aliphatic cyclic group is formed with a carbon atom ( * C), and the aliphatic cyclic group contains an electron-withdrawing group. [Chemical formula 1] 【Selection chart】 None |