http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2019066660-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_89afae566b725ae78e20cf972d9bcdc7 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C07D307-93 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H05K3-18 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-40 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-20 |
| filingDate | 2017-09-29-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_5629ea1962b41d0773eaf45e8af40283 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_164dc69fc7a29d8ef9a68fac4f41772f |
| publicationDate | 2019-04-25-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-2019066660-A |
| titleOfInvention | Chemical amplification type positive photosensitive resin composition, photosensitive dry film, method for producing photosensitive dry film, method for producing patterned resist film, method for producing templated substrate, method for producing plated shaped article, and Mercapto compound |
| abstract | An object of the present invention is to form a resist pattern on a metal surface of a substrate having a metal surface by using a chemically amplified positive photosensitive resin composition, in which a resist pattern to be a mold of a plated object is formed. Chemical amplification type positive photosensitive resin composition capable of suppressing the occurrence of “footing” in which the width of the bottom (support surface side) becomes narrower than the width of the surface side of the (a) Provided are a method of producing a dry film, a method of producing a patterned resist film, a method of producing the above-described templated substrate, and a method of producing a plated structure using the template-provided substrate. An acid generator (A) generates an acid upon irradiation with an actinic ray or radiation, a resin (B) whose solubility in an alkali increases by the action of an acid, and a mercapto compound having a structure of the following formula (C1) Chemically amplified positive photosensitive resin composition containing 【Selection chart】 None |
| priorityDate | 2017-09-29-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 517.