http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2019065155-A
Outgoing Links
Predicate | Object |
---|---|
assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_a665d61597c2731ab4130971ee397dc9 |
classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09K3-14 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B24B37-00 |
filingDate | 2017-09-29-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_b471632411d55416373b890756b0b272 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_7c91d772fac7bb4f41e4209dd8f7f7a1 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_be798c009117acf8fcc5e37e1cd9be5d |
publicationDate | 2019-04-25-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber | JP-2019065155-A |
titleOfInvention | Polishing composition and method of manufacturing magnetic disk substrate |
abstract | The present invention provides a polishing composition capable of effectively reducing the number of scratches present on a surface after polishing while maintaining a high polishing rate. A polishing composition for use in polishing a magnetic disk substrate is provided. The polishing composition contains abrasive grains, an acid, an oxidizing agent and water. The abrasive grains contain at least silica particles. The average primary particle diameter of the abrasive grains measured by the BET method is 1 nm or more and 50 nm or less. The pH is 1.8 to 3.0. The amount of sodium hydroxide required to raise the pH to 1.0 is 0.03 mol / L or more and 0.2 mol / L or less. 【Selection chart】 None |
isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-112824475-A |
priorityDate | 2017-09-29-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 226.