| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_a665d61597c2731ab4130971ee397dc9 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-304
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09G1-16
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09K3-1463
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09G1-02
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-3212
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-31053 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09K3-14
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B24B37-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-304 |
| filingDate |
2017-09-11-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_5c773d239ccd404fa0eddc5ae05e6d84
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_11147c4bacf2b61803909e1762156a7e |
| publicationDate |
2019-03-28-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
JP-2019050307-A |
| titleOfInvention |
Polishing method, polishing composition and method for producing the same |
| abstract |
An object of the present invention is to provide a means capable of reducing defects on the surface of an object to be polished including a silicon material. An object to be polished including a silicon material using a polishing composition having an abrasive grain, a trivalent or higher polyvalent hydroxy compound, and a dispersion medium, and having a pH of less than 6.0. A polishing method comprising the step of polishing. 【Selection chart】 None |
| priorityDate |
2017-09-11-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |