| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_4d72711e97d894c55af805c9de2053ab |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0045
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-004
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0046
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-26
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0397
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0392
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-027
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-029
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0382 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C07C381-12
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-20
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09K3-00 |
| filingDate |
2018-08-20-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_7feabab4404851399270b8110a2a8848
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_ccc8f4b7a0bd0fb3eff76cd394416939
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_cb8e7c00a20f1d357fe250c094c8ca22 |
| publicationDate |
2019-03-28-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
JP-2019049701-A |
| titleOfInvention |
Photoresist containing an acid generator and the same agent |
| abstract |
An acid generator compound that is particularly useful as a photoresist composition component is provided. In one preferred embodiment, (i) a polymer; (ii) a first onium hydrochloric acid generator that generates a first acid upon exposure of the photoresist composition to activating radiation; (iii) (iii) A photoresist comprising: a second onium hydrochloric acid generator comprising: 1) a covalently linked acid labile moiety; and (2) the photoresist composition generates a second acid upon exposure to activating radiation. A photoresist composition, wherein the first acid and the second acid have different pKa values by at least 0.5. 【Selection chart】 None |
| priorityDate |
2012-12-28-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |