| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_01dc8a8a3ae90ebd3658b65c494e2a4d |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09D11-322
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09D11-38
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09D11-107
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09D11-101 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H05K3-28
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B41J2-01
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09D11-30
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B41M5-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F220-40
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F222-06
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F2-50 |
| filingDate |
2018-07-13-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_674b74db2ddecd45d8fe04ababb85e5c
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_021e7f9f5b7d58dab4f07767dbf5a699 |
| publicationDate |
2019-03-14-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
JP-2019038256-A |
| titleOfInvention |
Radiation curable ink jet ink |
| abstract |
Radiation curable inks enable stable ink jet printing on a solder mask and exhibit excellent adhesion and high scratch resistance after curing. A) a monomer containing at least one vinyl ether group and at least one (meth) acrylate group; b) a monomer containing a 5-membered cyclic anhydride (formula below); and c) an aliphatic tertiary amine. An ink jet printing method in which a radiation curable ink containing is jetted onto a solder mask and cured. (Wherein R3 is selected from the group consisting of hydrogen, substituted or unsubstituted aryl groups and substituted or unsubstituted alkyl groups.) [Selection figure] None |
| priorityDate |
2012-10-24-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |