abstract |
A silicone skeleton-containing polymer compound capable of forming a thick fine film pattern and excellent in crack resistance, film characteristics, and film reliability, a photosensitive resin composition containing the compound, a photosensitive resin film, a photosensitive dry film, Providing a laminate using these and a pattern forming method. A silicone skeleton-containing polymer compound comprising a repeating unit represented by formula a1 and a repeating unit represented by formula b1. [X 1 is a divalent group represented by Formula 1; (Y 1 is a single bond or a specific divalent organic group)] [Selection figure] None |