| abstract |
A substrate on which a film such as silica is formed can be polished at a high speed by increasing the mechanical friction effect by using non-defect abrasive grains, and at the same time, high surface accuracy such as low scratch is achieved. A polishing composition is provided. A polishing composition comprising abrasive grains, modified microfibril cellulose having a carboxy group in a cellulose unit, and a dispersion medium. A polishing composition, wherein the modified microfibril cellulose is a modified microfibril cellulose in which at least a part of the hydroxyl group at the C6 position of the cellulose unit is oxidized to a carboxy group. Polishing composition whose each content of Na and K is 100 ppm or less per solid content weight. [Selection] Figure 2 |