http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2019006990-A
Outgoing Links
Predicate | Object |
---|---|
assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_24aca9ded2638ea793d05360dde7a4a0 |
classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-20 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-038 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C07C69-96 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F20-18 |
filingDate | 2018-06-15-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_153d9ab45d90d19234e4e5282fb77563 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_a5a0f29773a00a81cffeccef5e6a21c8 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_a144f3526dc1d67cb5c2c69f8714bf36 |
publicationDate | 2019-01-17-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber | JP-2019006990-A |
titleOfInvention | Compound, resin, resist composition, and method for producing resist pattern |
abstract | An object of the present invention is to provide a compound, a resin, and a resist composition capable of producing a resist pattern with good line edge roughness. A compound represented by formula (I), a resin containing a structural unit derived from the compound, and a resist composition containing the resin. [In Formula (I), R 1 represents a hydrogen atom or a methyl group. R 2 and R 3 each independently represent a hydrogen atom or a saturated hydrocarbon group having 1 to 6 carbon atoms. Ar represents a C6-C36 divalent aromatic hydrocarbon group which may have a substituent. ] [Selection figure] None |
priorityDate | 2017-06-23-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 210.