abstract |
The present invention provides a compound capable of producing a resist pattern with good line edge roughness, a resin having a structural unit derived therefrom, and a resist composition containing the compound. A compound represented by formula (I). [Wherein, R1 represents an H atom or a methyl group, R2 represents a saturated hydrocarbon group having 1 to 6 carbon atoms, R3 represents an H atom or a saturated hydrocarbon group having 1 to 6 carbon atoms, and Ar represents a substituent. X1 represents a divalent oxygen-containing group, which may have a divalent aromatic hydrocarbon group having 6 to 36 carbon atoms. ] [Selection figure] None |