http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2019000646-A

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filingDate 2018-06-15-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_3476150bcbe019e7ee1f5d9c8c8a7b20
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publicationDate 2019-01-10-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber JP-2019000646-A
titleOfInvention Micro needle
abstract A method of manufacturing a plurality of silicon microneedles having a beveled tip is provided. Forming a first mask array for defining a gap on a front surface of a silicon substrate having a front surface and a rear surface, and applying SF6 plasma etching to the front surface through the gap of the first mask array. To provide one or more etching features 16 having inclined surfaces, undercutting the first mask array, forming a second mask array on the etching features 16, A DRIE (deep reactive ion etching) anisotropic plasma etching is performed on the etched front surface to form a plurality of microneedles having beveled tips, and the inclined surface of the etching feature 16 is at least partially microscopic. Producing a beveled tip of the needle, and manufacturing a microneedle Is the method. [Selection] Figure 1
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Total number of triples: 28.