Predicate |
Object |
assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_3b74e149091c89a4825ef0db8d431755 |
classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B81C1-00531 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B81B2201-055 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/A61M2037-003 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/A61M2037-0053 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/A61M2037-0023 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B81B1-008 |
classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-30655 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/A61K9-0021 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/A61M37-0015 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B81C1-00111 |
classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/A61L31-06 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/A61M37-00 |
filingDate |
2018-06-15-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_3476150bcbe019e7ee1f5d9c8c8a7b20 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_a363131eea42bbc4b94ea3d06195fc62 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_9a76e4c0ccec28385154502008611b47 |
publicationDate |
2019-01-10-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber |
JP-2019000646-A |
titleOfInvention |
Micro needle |
abstract |
A method of manufacturing a plurality of silicon microneedles having a beveled tip is provided. Forming a first mask array for defining a gap on a front surface of a silicon substrate having a front surface and a rear surface, and applying SF6 plasma etching to the front surface through the gap of the first mask array. To provide one or more etching features 16 having inclined surfaces, undercutting the first mask array, forming a second mask array on the etching features 16, A DRIE (deep reactive ion etching) anisotropic plasma etching is performed on the etched front surface to form a plurality of microneedles having beveled tips, and the inclined surface of the etching feature 16 is at least partially microscopic. Producing a beveled tip of the needle, and manufacturing a microneedle Is the method. [Selection] Figure 1 |
priorityDate |
2017-06-16-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type |
http://data.epo.org/linked-data/def/patent/Publication |