| Predicate |
Object |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08G73-10
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07D413-12
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08G73-0293
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07D241-04
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C25D3-38
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07D265-33
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C25D7-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08G73-028
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C25D3-32
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C25D7-123
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09D179-08 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C25D3-32
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C25D3-38
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08G69-26 |
| filingDate |
2015-04-28-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate |
2018-07-05-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
JP-2018517793-A |
| titleOfInvention |
Reaction product of bis anhydride and diamine as additive for electroplating bath |
| abstract |
The reaction products of primary and secondary diamines and bis anhydrides are included as additives in the metal electroplating bath. Metal electroplating baths have good throwing power and deposit a metal layer having a substantially planar surface. Metal plating baths can be used to deposit metal on substrates having surface features such as through holes and vias. [Selection figure] None |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2018513282-A |
| priorityDate |
2015-04-28-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |