| Predicate |
Object |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-2041
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-30
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-2004
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-20 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0043
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0045
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0047
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-16
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0002
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-039 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-20
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 |
| filingDate |
2015-12-01-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate |
2018-01-25-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
JP-2018502327-A |
| titleOfInvention |
RESIST COMPOSITION, METHOD FOR FORMING RESIST PATTERN, METHOD FOR PRODUCING RESIST COMPOSITION, USE OF PEROVSKITE MATERIAL FOR LITHOGRAPHIC PROCESS AND SUBSTRATE COATED WITH RESIST COMPOSITION |
| abstract |
A resist composition is disclosed. The resist composition comprises a perovskite material having a structure having a chemical formula selected from ABX 3 , A 2 BX 4 or ABX 4 . A may be a compound containing an NH 3 group, B may be a metal, and X may be a halogen component. The perovskite material may comprise one or more of the following compounds, halogen mixed perovskite materials, metal mixed perovskite materials and organic ligand mixed perovskite materials. [Selection] Figure 1 |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2020520469-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-7173593-B2 |
| priorityDate |
2014-12-23-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |