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publicationDate 2018-01-11-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber JP-2018500767-A
titleOfInvention Novel method of atomic layer etching (ALE) using sequential self-controlled thermal reaction
abstract The present invention includes a method for promoting surface atomic layer etching (ALE). In certain embodiments, the method includes sequential reaction of a metal precursor and a halogen-containing gas. The present invention provides a solid substrate obtained according to any of the methods of the present invention. The present invention further provides a porous substrate obtained according to any of the methods of the present invention. The present invention further provides a patterned solid substrate obtained according to any of the methods of the present invention.
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