http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2018204102-A

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filingDate 2018-05-21-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_10d5e4dff91545f53df7a81d33226418
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_abf91c1c95c21bbc5b9997e081606fca
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publicationDate 2018-12-27-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber JP-2018204102-A
titleOfInvention Manufacturing method of high purity electrolytic copper
abstract The present invention provides a method for producing high-purity electrolytic copper in which the orientation difference between crystal grains is small and the concentration of all impurities such as Ag and S is extremely low. A first additive comprising a hydrophobic aromatic ring and a hydrophilic polyoxyalkylene group (A), a second additive comprising a polyvinyl alcohol (B), and a third additive comprising a tetrazole. (C) is added to the copper electrolyte, and the concentrations of the first additive (A), the second additive (B), and the third additive (C), and the current density and bath temperature are controlled. By performing copper electrolysis, the Ag concentration is less than 0.2 mass ppm, the S concentration is less than 0.07 mass ppm, and the total impurity concentration is less than 0.2 mass ppm. Is characterized by producing electrolytic copper in which the crystal grains exceeding 2.5 ° are 10% or less in area ratio. [Selection figure] None
priorityDate 2017-06-02-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

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