Predicate |
Object |
assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_ad2cd796f8c4dcb425ddcc68707d3444 |
classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B32B27-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B05D7-24 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B05D7-04 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08J7-04 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B05D1-18 |
filingDate |
2017-06-01-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_7b994a9d0e27dfe5ee5ea5b24920afde http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_2c3554819136ac1a67c7f91bd0ec014a http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_19955791f7fceb3a85384ff8d7043c93 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_2bab812510ba543072985d163848205e http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_b266c7dd60edeaeb6c38b292f82f60da http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_03d2423a3eee4743a108feb0751bd523 |
publicationDate |
2018-12-27-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber |
JP-2018202308-A |
titleOfInvention |
Silane coupling agent treatment method, silane coupling agent treatment substrate production method, and laminate production method |
abstract |
PROBLEM TO BE SOLVED: To provide a treatment method for obtaining a high-quality silane coupling agent-treated base material with little foreign matter and a method for producing the treated base material. The substrate is brought into contact with a silane coupling agent treatment liquid at -18 ° C or higher and 40 ° C or lower for a time of 1 second or longer and 10 minutes or shorter, and then substantially free of silane coupling agent. The substrate is brought into contact with the solvent for 3 seconds or more and 10 minutes or less, and dried as necessary to obtain a silane coupling agent-treated substrate. An inorganic substrate and a polymer film can be applied as the substrate. Furthermore, the laminate obtained using the treated substrate can be usefully applied to the manufacturing process of the flexible electronic device. [Selection figure] None |
isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-7205706-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2021065101-A1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-114107974-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/TW-I778422-B http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-114107974-B http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2021070719-A1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-WO2021065101-A1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-114423612-A |
priorityDate |
2017-06-01-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type |
http://data.epo.org/linked-data/def/patent/Publication |