http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2018200419-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_fcc0b66123940d1b32783569ebfa2d45 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-38 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08G75-045 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-20 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039 |
| filingDate | 2017-05-29-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_25de3dd344e376233255ba3ca16e39ba http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_d32c286d5b6f2f328c18f930e3e1c044 |
| publicationDate | 2018-12-20-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-2018200419-A |
| titleOfInvention | Radiation-sensitive composition, radiation-sensitive resin composition, and pattern forming method |
| abstract | The present invention provides a radiation-sensitive composition capable of reducing the adverse effects of heat treatment on an unexposed portion and enabling fine processing, and a pattern forming method using the composition. A radiation-sensitive composition containing at least an S compound having a plurality of thiol groups, and an E compound having a plurality of functional groups capable of thiol-ene reaction and a structural moiety represented by the following formula (1): object. (In formula (1), R 1 and R 2 are each independently a primary or secondary alkyl group having 1 to 8 carbon atoms, and a hydrocarbon group, a fluorinated alkyl group, or a siliconized alkyl group as a substituent. May have a group.) [Selection figure] None |
| priorityDate | 2017-05-29-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 105.