http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2018199650-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_fcc0b66123940d1b32783569ebfa2d45 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C07D487-04 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08G75-045 |
| filingDate | 2017-05-29-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_c4af47cec30be0e981addc1ce24ffb81 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_75f3c62c83efbf8f9c65e5073ef7255a http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_ad4303c08fb17c1a005bd6b4d636e7ea http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_d32c286d5b6f2f328c18f930e3e1c044 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_25de3dd344e376233255ba3ca16e39ba |
| publicationDate | 2018-12-20-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-2018199650-A |
| titleOfInvention | Compounds that can be used in resist |
| abstract | An object of the present invention is to provide a radiation-sensitive compound capable of reducing the adverse effects of heat treatment on an unexposed portion and enabling fine processing. A compound represented by formula (1). (R1 and R3 are each independently a hydrocarbon group, a fluorinated alkyl group or a siliconized alkyl group substituted / unsubstituted C1-8 primary or secondary alkyl group, and R2 and R4 are each independently a hydrocarbon. A C1-8 alkyl group or aryl group substituted / unsubstituted by a group, a fluorinated alkyl group or a siliconized alkyl group; X is a C1-12 divalent hydrocarbon group; R5 is an organic group containing a polymerizable group; Z is an n-valent organic group; n is an integer from 1 to 10) [Selection] None |
| priorityDate | 2017-05-29-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 65.