| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_eccd894c99fea2d1c0c8735872bb2309 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-039
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0226
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0045
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0757
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0233
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08G77-04 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-075
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08L83-04
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08K5-23
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-023 |
| filingDate |
2017-04-28-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_363f4521eb7c2981e428144e78650c47
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_57bdcdcff1d268c9646901b86c2dba50
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_7842f576dcf53180e70b2a009495bc5b |
| publicationDate |
2018-11-29-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
JP-2018189738-A |
| titleOfInvention |
Positive photosensitive siloxane composition and cured film formed using the same |
| abstract |
PROBLEM TO BE SOLVED: To provide a positive photosensitive composition capable of forming a cured film having high transmittance. SOLUTION: A polysiloxane, a diazonaphthoquinone derivative, an additive containing> NC (= O)-or> NC (= S) -structure and capable of interacting with the polysiloxane, and a solvent. Positive photosensitive siloxane composition. There is an interaction between the additive and the polysiloxane before exposure, but the interaction is lost by exposure. [Selection figure] None |
| priorityDate |
2017-04-28-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |