http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2018183980-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_1af8df51ce24ca931ae718fb747f6aa0 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B41J2-1603 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B41J2-1606 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B41J2-1639 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B41J2-1645 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B41J2-1623 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B41J2-1631 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B41J2-16 |
| filingDate | 2018-03-16-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_20ba82cbaf02d506d98b200df2dc6970 |
| publicationDate | 2018-11-22-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-2018183980-A |
| titleOfInvention | Method for manufacturing liquid discharge head |
| abstract | When exposing a second negative photosensitive resin layer for forming a discharge port, reflected light from a substrate surface is suppressed and the discharge port is formed with high accuracy. A step of forming a first negative photosensitive resin layer including a photopolymerizable compound and a photopolymerization initiator on a substrate, and exposing the first negative photosensitive resin layer. And forming a latent image of the flow path forming member 4 and a second negative containing a photopolymerizable compound and a photopolymerization initiator on the first negative photosensitive resin layer 9 having the latent image. And forming a latent image of the discharge port forming member 7 by exposing the second negative photosensitive resin layer and forming a latent image of the first negative photosensitive resin. The thickness of the resin layer 9 is 10 μm or less, and the first negative photosensitive resin layer 9 further includes a sensitivity adjusting agent that lowers the sensitivity of the first negative photosensitive resin layer 9, In the photosensitive resin layer 9, the exposure light transmittance A when exposing the second negative photosensitive resin layer 11 is 0.70 or less. [Selection] Figure 2 |
| priorityDate | 2017-04-25-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 43.