| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_ec83ea8e6721b1a5654b038fdb9b223f |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02052
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B08B2203-002 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02343
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-6715
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02057
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02052
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02068
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-304
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-67028
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B08B3-08
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-67017
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-6708
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-67051 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-304 |
| filingDate |
2017-04-19-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_983e04fd21f7236969e90b4c0113ad50
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_fb1e4c6d48e70baab50fb5a65e27c7ff |
| publicationDate |
2018-11-15-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
JP-2018182212-A |
| titleOfInvention |
Substrate processing method and substrate processing apparatus |
| abstract |
The present invention provides a substrate processing method and a substrate processing apparatus capable of suppressing metal corrosion in a configuration for processing a substrate having a metal exposed surface. A substrate W having a metal exposed surface is held. By supplying an inert gas near the surface of the substrate W, the atmosphere around the surface of the substrate W is replaced with the inert gas (N 2 ). The pH of the rinse solution is adjusted so that the metal exposed from the surface of the substrate W forms an inactive state that does not react with the rinse solution, or the metal reacts with the rinse solution to form a passive state. Ru. After the atmosphere around the surface of the substrate is replaced with an inert gas, a pH-adjusted rinse solution is supplied to the surface of the substrate W. [Selected figure] Figure 6D |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2020195081-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2020161522-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10699920-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-7194623-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/TW-I737180-B
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2022034712-A1 |
| priorityDate |
2017-04-19-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |