http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2018158988-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_a665d61597c2731ab4130971ee397dc9 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09G1-02 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-3212 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-304 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B24B37-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09G1-02 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09K3-14 |
| filingDate | 2017-03-22-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_dd4c61b35b21ca1a61b11f05f08bb562 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_20458c8c18df959db2209b8df1f3ad0a http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_9c7df139bb8b8a4400ab8cda5a63fb4a |
| publicationDate | 2018-10-11-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-2018158988-A |
| titleOfInvention | Polishing composition |
| abstract | Provided is a polishing composition having a high polishing rate, a low etching rate, and capable of achieving sufficient planarization. A polishing composition comprising abrasive grains, an oxidizing agent, an acid, an anticorrosive containing a compound represented by the following formula (1) or a salt thereof, and a dispersion medium. (In the formula (1), R 1 is a linear or branched alkyl group having 6 to 30 carbon atoms or a linear or branched alkenyl group having 6 to 30 carbon atoms, and R 2 is A single bond, or an alkylene group having 1 to 4 carbon atoms, and R 3 is a hydrogen atom or a linear or branched alkyl group having 1 to 10 carbon atoms.) [Selection figure] None |
| priorityDate | 2017-03-22-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 391.