Predicate |
Object |
assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_89afae566b725ae78e20cf972d9bcdc7 |
classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B32B15-082 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F2-50 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F20-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-031 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C07C251-66 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-027 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-20 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-40 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C25D5-02 |
filingDate |
2017-03-10-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_b73dc7ba6f1507e02f752481e5add64a http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_9934d76f5c383f53db84f9b59d623b78 |
publicationDate |
2018-09-27-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber |
JP-2018151490-A |
titleOfInvention |
Method for forming cured film and method for producing plated model |
abstract |
A negative photosensitive composition capable of forming a resist pattern having a non-resist portion having a rectangular shape with a low cross-sectional shape even when a thick resist pattern having a thickness of 80 μm or more is formed. A method for forming a patterned cured film, and a method for producing a plated model using a substrate provided with a patterned cured film formed by the method as a mold for forming a plated model. To provide. A negative photosensitive composition comprising (A) a photopolymerizable compound and (B) a photopolymerization initiator containing an oxime ester compound having a specific structure having a 9,9-disubstituted fluorenyl group. Used to form a thick resist pattern. [Selection figure] None |
isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2020195285-A1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-113412288-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-113412288-B |
priorityDate |
2017-03-10-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type |
http://data.epo.org/linked-data/def/patent/Publication |