http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2018128477-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_268be9afa00cf55b5aa72b1612151ecb |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-038 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-20 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-40 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 |
| filingDate | 2015-10-28-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_57d69c998ba644a25a483999a8d015ba http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_898802992cbabd9455d2e28e949dee45 |
| publicationDate | 2018-08-16-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-2018128477-A |
| titleOfInvention | Pattern forming method and electronic device manufacturing method |
| abstract | A pattern forming method and an electronic device manufacturing method capable of forming a pattern having an excellent CDU are provided. A film forming step of forming a film using an actinic ray-sensitive or radiation-sensitive resin composition on a base layer of a support having a base layer and a substrate, an exposure step of exposing the film, and an exposure step The subsequent film is developed to form a resist pattern and at least a part of the underlayer is exposed, and the exposed underlayer is etched using plasma generated from a processing gas containing a deposition gas and the resist is exposed. An etching process for depositing a deposit on the side surface of the pattern, wherein the composition contains a resin having an acid-decomposable group having a weight average molecular weight of 5,000 or more, and a development process The pattern formation method which is a process of implementing any one process among an alkali image development process and an organic-solvent image development process, and implementing the other process after that. [Selection figure] None |
| isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2020235608-A1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-WO2020235608-A1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-112920314-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2023058365-A1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-7195418-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/EP-3974047-A4 |
| priorityDate | 2015-06-19-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 287.