| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_da0d4484b6e67ecfe8ea6883a04faa6a |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/F24F6-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B01D53-70
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B01D53-62
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B01J19-08
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B01D53-56
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B01D53-50
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/A61L9-22
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B01D53-44
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H05H1-24
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B01D53-32
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/F24F7-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B01D53-76 |
| filingDate |
2017-01-26-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_3c21a73b6c20266524fc2412b0a2f7a3
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_b492c54f4cc5fad74f7e31ccd4056020
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_43aa8e581e780c94350e68028950fe2f |
| publicationDate |
2018-08-02-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
JP-2018118220-A |
| titleOfInvention |
Gas processing equipment |
| abstract |
An object of the present invention is to realize energy saving control and humidity reduction control while emphasizing gas processing capacity. A mixing ratio applied voltage changing unit 9 is provided. The mixing ratio applied voltage changing unit 9 determines the difference Δh (Δh = hF−) between the first absolute humidity (the absolute humidity of the gas D to be mixed) hF and the second absolute humidity (the absolute humidity of the processed gas E) hR. hR) is within the reference humidity difference range ΔhB ± α, and the mixing ratio M controlled by the mixing control unit 7 is set to a practical upper limit on condition that the current processing capability exhibited by the plasma processing unit 3 is maintained. While changing within the range from the mixing ratio Mmax to the practical lower limit mixing ratio Mmin, the voltage V applied between the electrodes of the plasma processing unit 3 is changed within the range from the practical upper limit voltage Vmax to the practical lower limit voltage Vmin. [Selection] Figure 1 |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2018118219-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2018118221-A |
| priorityDate |
2017-01-26-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |