http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2018115100-A
Outgoing Links
Predicate | Object |
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assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_7a37d7a7385924dd55e29ac1e96d1492 |
classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C04B35-01 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C14-34 |
filingDate | 2017-01-20-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_a1e813d5a8b51db1c860ed6cc999a7ba http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_2eeb654412115449e44135348731a838 |
publicationDate | 2018-07-26-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber | JP-2018115100-A |
titleOfInvention | LiCoO2 sintered body and manufacturing method thereof |
abstract | A LiCoO2 sintered body having a specific resistance of 100 Ω · cm or less and a relative density of 95% or more, wherein the concentration of impurity elements contained in the sintered body is 1000 ppm or less, and the sintering LiCoO2 sintered body in which the average particle diameter of LiCoO2 particles present in the body is 5 to 30 [mu] m. [Effect] The LiCoO2 sintered body of the present invention has a small specific resistance, a high relative density, a high purity, and a small average particle diameter of LiCoO2 particles present in the sintered body. For this reason, the LiCoO2 sputtering target material obtained from the LiCoO2 sintered body has high mechanical strength and is not easily cracked. When sputtering is performed using this target material, abnormal discharge and cracking of the sputtering target are suppressed. In addition, the deposition rate by DC sputtering can be improved, and a high purity LiCoO2 thin film can be manufactured. [Selection figure] None |
priorityDate | 2017-01-20-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 29.