http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2018113390-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_d80f1040809503e54509c871ba828f75 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-67213 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-67242 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-67017 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 |
| filingDate | 2017-01-13-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_2f02e80abd039a81970b388446abc57e http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_e115ae769665483cf6138ac2a9a44a9b |
| publicationDate | 2018-07-19-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-2018113390-A |
| titleOfInvention | Substrate processing equipment |
| abstract | An object of the present invention is to appropriately measure the concentration of a processing gas using a simple apparatus. A hydrophobizing apparatus 41 for processing a wafer W using a processing gas containing ions includes a processing container 300 that accommodates the wafer W, and a gas supply unit 320 that supplies HMDS gas into the processing container 300. An exhaust unit 340 that exhausts the inside of the processing container 300, and an ion sensor 346 that measures the number of ions contained in the gas at least inside the processing container 300, inside the gas supply unit 320, or inside the exhaust unit 340. Have. [Selection] Figure 4 |
| priorityDate | 2017-01-13-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 27.