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publicationDate 2018-07-05-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber JP-2018107447-A
titleOfInvention Semiconductor device and manufacturing method of semiconductor device
abstract A semiconductor device with high on-state current is provided. A first conductor disposed on a substrate, a first insulator disposed on the first conductor, and a first oxidation disposed on the first insulator. A second oxide disposed on the first oxide; a second insulator disposed on and in contact with a top surface of the second oxide; and a side surface of the second oxide; A second conductor disposed on the second insulator; a side surface of the second insulator; and a third insulator disposed in contact with the side surface of the second conductor. The film thickness of the second oxide is equal to or greater than the length of the second oxide in the channel width direction, and the second conductor is connected to the upper surface and the side surface of the second oxide via the second insulator. The carrier density on the side surface of the second oxide is larger than the carrier density on the upper surface of the second oxide. [Selection] Figure 1
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