| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_47cc435e1d443f13180f7766df104d9d |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C01P2004-61
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C01P2004-62 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09K3-1463
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09K3-1409
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09G1-02
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C01F17-235
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C01F17-10
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-31053
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C01F17-247 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09K3-14
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09G1-02
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-304
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C01F17-235
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B24B37-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-321
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-3105 |
| filingDate |
2018-02-06-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_3d51e1d6630e00698ce13bfbe1905425
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_6e39483d0b83acd2371d57dc5720148b |
| publicationDate |
2018-07-05-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
JP-2018104711-A |
| titleOfInvention |
Method for producing cerium salt, cerium oxide and cerium-based abrasive |
| abstract |
The present invention provides a cerium-based abrasive that generates less scratches on a surface to be polished during polishing. A cerium-based abrasive containing cerium oxide particles, which is obtained by drying the cerium-based abrasive, the dried product containing cerium oxide particles comprises 12.5 g of 6 N nitric acid and 30% of nitric acid. A cerium-based abrasive in which when 20 g is dissolved in a mixed solution with 12.5 g of hydrogen peroxide solution, the concentration of insoluble components present in the solution is 1 ppm or less by mass ratio. [Selection figure] None |
| priorityDate |
2003-09-12-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |