http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2018090853-A

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classificationIPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C25D5-02
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filingDate 2016-12-02-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_0fe61b25d441085c5c8554f2feeb8cc8
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publicationDate 2018-06-14-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber JP-2018090853-A
titleOfInvention Electroplating cell and metal film manufacturing method
abstract An electroplating cell capable of easily forming a metal film and a method for producing a metal film using the same. An electroplating cell (10) includes an anode chamber (12) for holding an anode chamber liquid (20) and a diaphragm (16) for isolating the anode chamber (12) and a cathode (26). The diaphragm 16 has a peak position (q2 value) derived from the structure of molecular microcrystals of 0.05Å-1 (0.5 nm-1) or less in a scattering spectrum measured in water at room temperature by a small angle X-ray scattering method. It consists of something. A metal coating 28 is formed on the surface of the cathode 26 using the electroplating cell 10 having such a diaphragm 16. [Selection] Figure 1
priorityDate 2016-12-02-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

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