| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_ccb2f721f6d2a7f79ce09d39998cea87 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B24B37-24
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-304 |
| filingDate |
2016-12-06-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_030cafb5b3c286174c2ac43e72eddced
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_d5e15632c923a2cf6b80f249109ccbf8
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_f04694f5169da8e8e743b00bacf13c17
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_b3f122e4f9e29f3e1282f1cecf30fcb9
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_0076f6f3cc603e05c49f8829613e2a02 |
| publicationDate |
2018-06-14-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
JP-2018089749-A |
| titleOfInvention |
Polishing pad and manufacturing method thereof |
| abstract |
A polishing pad having excellent polishing rate stability and polishing uniformity is provided. A polishing pad comprising a polyurethane resin sheet wet-formed, wherein the polyurethane resin sheet contains a polyurethane resin and a nonionic surfactant, and the nonionic surfactant is the surfactant. The said polishing pad which has a cloud point at the temperature of 60 degrees C or less when a cloud point is measured using the aqueous solution which contains 0.2g / L. [Selection] Figure 1 |
| priorityDate |
2016-12-06-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |