http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2018076566-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_aad56a6a237e60c5056ee257080505b8 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C14-34 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C14-35 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C14-56 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-54 |
| filingDate | 2016-11-10-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_733832fd2ce80f0ea9898569ed3d8f5e |
| publicationDate | 2018-05-17-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-2018076566-A |
| titleOfInvention | Thin film forming equipment |
| abstract | [PROBLEMS] To continuously perform various vacuum treatments such as surface treatment and thin film formation by continuously loading a work, and to realize high-quality and high-performance thin film formation on a work in a short time. Provided is a thin film forming apparatus capable of performing the above. A main chamber 12 having a load lock space 16a, a first surface treatment space 16b, a sputtering treatment space 16c, and a second surface treatment space 16d, and a work chamber 17a to house a workpiece. In the thin film forming method using the thin film forming apparatus provided with 17d, when the work chambers 17a to 17d are in the first position pressed against the lid member 14 of the main chamber 12, introduction of work in the load lock space 16a or It takes out and vacuum-processes independently with respect to a workpiece | work in each space 16b-16d. [Selection] Figure 5 |
| priorityDate | 2016-11-10-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 25.