http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2018062508-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_24aca9ded2638ea793d05360dde7a4a0 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-038 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F20-28 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C07C69-96 |
| filingDate | 2017-10-02-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_c2a9aacf507db12b95a8f92ddad3e63f http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_a144f3526dc1d67cb5c2c69f8714bf36 |
| publicationDate | 2018-04-19-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-2018062508-A |
| titleOfInvention | Compound, resin, resist composition, and method for producing resist pattern |
| abstract | The present invention provides a compound, a resin, and a resist composition containing the resin that can produce a resist pattern having a good mask error factor (MEF). A compound represented by formula (I). [R 1 is an alkyl group which may have a halogen atom, a hydrogen atom or a halogen atom; R 2 and R 3 are each a fluorinated hydrocarbon group or a * -A t46 -X t44 -A t47; A t46 and A t47 is an aliphatic hydrocarbon group which may have a fluorine atom; X t44 is a carbonyloxy group or an oxycarbonyl group; at least one of A t4 6 and A t47 has one or more fluorine atoms. A 1 is a trivalent hydrocarbon group; —CH 2 — contained in the hydrocarbon group may be replaced by —O— or —CO—. ] [Selection figure] None |
| isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-7333202-B2 |
| priorityDate | 2016-10-07-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 214.