| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_fec576c38e34882531ca37d6b922bf42 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F20-22
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-20 |
| filingDate |
2016-09-12-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_24a308a0c8dacf831db97e6a1138b3ce
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_b1abab99ad6295a03bd45bb4b4e2fa4f
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_dc761b9524d04fe925b0e6f1b2545463 |
| publicationDate |
2018-03-22-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
JP-2018044034-A |
| titleOfInvention |
Fluorinated monomer, fluorinated polymer thereof, resist using the same, and pattern forming method |
| abstract |
Provided is a fluoropolymer as a resist component for forming a fine resist pattern with little roughness. A fluorine-containing polymer containing a repeating unit represented by the formula (1). (R 1 is H or protecting group; A is a group containing a substituted or unsubstituted adamantane ring with a hydroxyl group or a thiol group) [Selection figure] None |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2022176883-A1 |
| priorityDate |
2016-09-12-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |