abstract |
A salt suitable for a resist composition capable of producing a resist pattern having a good mask error factor (MEF) is provided. A salt represented by formula (I). [In the formula (I), R 1 and R 2 each independently represents an aromatic hydrocarbon group having 6 to 18 carbon atoms which may have a substituent. X 1 represents a C1-C12 divalent aliphatic saturated hydrocarbon group, and the methylene group constituting the divalent aliphatic saturated hydrocarbon group may be replaced by an oxygen atom or a carbonyl group. . A − represents an organic anion. ] [Selection figure] None |