http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2018024861-A
Outgoing Links
Predicate | Object |
---|---|
assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_dbdfa36b677f4ef61245ca725011e221 |
classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08L59-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08G2-28 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08K5-19 |
filingDate | 2017-07-28-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_4aabf0fe275f16cc82ce7d8914714fa5 |
publicationDate | 2018-02-15-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber | JP-2018024861-A |
titleOfInvention | Polyacetal resin composition |
abstract | [Problem] To provide a polyacetal resin composition having a high purity with less generation of formaldehyde, acetaldehyde and acrolein even when heat treatment such as heat melting is performed. A polyacetal resin composition comprising a polyacetal (A) and a quaternary ammonium compound (B) represented by the formula (1). [(R1) m (R2) 4-m N +] n X n- (1) {R1 is each independently an unsubstituted substituted hydrocarbon group C6~20 aryl group; R2 is a carbon in Total independently Formula (2) having a number of 2 to 60 and an oxygen number of 2 to 30; m and n are integers of 1 to 3; X is a hydroxyl group or a C1-20 monocarboxylic acid, hydrogen acid, oxo acid, inorganic thioacid or An acid residue of a compound selected from C1-20 organic thioacids and a group containing no N. -(RO) k-H (2) (R is a substituted / unsubstituted alkylene group; k is an integer of 2 or more)} [Selection figure] None |
isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2022091522-A1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20220058884-A |
priorityDate | 2016-07-29-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 373.