http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2018024650-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_dbdfa36b677f4ef61245ca725011e221 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C07C217-08 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/A61L9-01 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C07C53-08 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C07C53-02 |
| filingDate | 2017-07-28-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_4aabf0fe275f16cc82ce7d8914714fa5 |
| publicationDate | 2018-02-15-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-2018024650-A |
| titleOfInvention | Quaternary ammonium compounds |
| abstract | The present invention provides a quaternary ammonium compound for obtaining a high-purity polyacetal resin composition that suppresses generation of formaldehyde, acetaldehyde, and acrolein even by heat treatment such as heat melting. A quaternary ammonium compound represented by formula (1) is provided. [(R1) m (R2) 4-m N +] n X n- (1) (R1 is each independently unsubstituted / substituted alkyl group C1-30, an aryl group of C6-20; each R2 is A group represented by the following formula:-(RO) k-H; R is a substituted / unsubstituted alkylene group; k is a natural number of 2 or more; n is an integer of 1 to 3; X is a hydroxyl group or an acid residue of a compound selected from C1-20 monocarboxylic acid, hydrogen acid, oxo acid, inorganic thioacid or C1-20 organic thioacid, and N No group). [Selection figure] None |
| priorityDate | 2016-08-01-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 147.