abstract |
A resist composition capable of producing a resist pattern having an excellent shape is provided. A resist composition comprising a resin whose solubility in an alkaline aqueous solution is increased by the action of an acid, an acid generator, a compound represented by formula (I), and a solvent, wherein the content of the solvent is a resist. The resist composition which is 40-75 mass% with respect to the total amount of a composition. [In Formula (I), Ring W 1 represents a heterocyclic ring having a nitrogen atom as an atom constituting the ring, or a benzene ring having a substituted or unsubstituted amino group. A 1 represents a phenyl group or a naphthyl group. n represents 2 or 3. ] [Selection figure] None |