http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2018018038-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_268be9afa00cf55b5aa72b1612151ecb |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-038 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-20 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-40 |
| filingDate | 2016-07-29-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_898802992cbabd9455d2e28e949dee45 |
| publicationDate | 2018-02-01-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-2018018038-A |
| titleOfInvention | Pattern forming method and electronic device manufacturing method using the same |
| abstract | In a pattern forming method using a double patterning process, there is provided a pattern forming method in which damage to a substrate is small and the process is simplified. Moreover, the manufacturing method of the electronic device using the said pattern formation method is provided. A resist film forming step of forming a resist film on a substrate using an actinic ray-sensitive or radiation-sensitive resin composition, an exposure step of exposing the resist film, and the exposed resist film. Developing with a developer containing an organic solvent to form a first pattern; forming an inorganic film so as to cover the first pattern; and An etching process that removes by etching so as to remain only on the side wall of the pattern, and a process that forms the second pattern made of the inorganic film by removing the first pattern using an alkaline treatment liquid. A pattern forming method. [Selection figure] None |
| isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-7091762-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-WO2019216118-A1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2019216118-A1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11747725-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-112920314-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2018180525-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-110895380-A |
| priorityDate | 2016-07-29-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 180.