http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2018013799-A
Outgoing Links
Predicate | Object |
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assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_dbdfa36b677f4ef61245ca725011e221 |
classificationCPCAdditional | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H05K3-287 |
classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F2-48 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-09 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-028 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-027 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-033 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-004 |
classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-027 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-033 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F290-06 |
filingDate | 2017-09-27-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_c7af3b910fec23aaab69d030bf67f830 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_09edfa81f96f62d73c53e70fba23f719 |
publicationDate | 2018-01-25-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber | JP-2018013799-A |
titleOfInvention | Photosensitive resin element |
abstract | Provided is a photosensitive resin element that has a good appearance, has a long product life, and reduces defects caused by a resist chip in a laminating process when a printed circuit board is produced. The present disclosure is a photosensitive resin element including a support layer and a photosensitive resin layer on the support layer, the photosensitive resin layer comprising: (a) a carboxyl group content in an acid equivalent. A binder resin having a weight average molecular weight of 5,000 to 500,000, (b) a photopolymerizable unsaturated compound, (c) a photopolymerization initiator, and (d) a solvent, The photosensitive resin layer contains the solvent (d) in an amount of 0.001% by mass or more and 1% by mass or less based on the mass of the photosensitive resin layer, and the photosensitive resin layer (b) is photopolymerizable. Provided is a photosensitive element containing at least one compound selected from general formulas (I) to (III) as an unsaturated compound. [Selection figure] None |
isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2023188008-A1 |
priorityDate | 2013-11-29-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 297.