http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2017527324-A

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filingDate 2015-06-26-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationDate 2017-09-21-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber JP-2017527324-A
titleOfInvention System and method for monitoring and controlling absorbent article processing lines
abstract The present disclosure relates to a method and apparatus for monitoring a substrate that is advanced in a machine direction along a processing device. The apparatus may include an analyzer that connects with the line scan camera via a communication network. The analyzer can be configured as a field programmable gate array, an application specific integrated circuit, or a graphical processing unit. In addition, a line scan camera can include a linear array of pixel data to define a linear field of view. The line scan camera is arranged such that the linear field of view extends in the machine direction. The apparatus may further include an illumination source that illuminates the linear field of view. In operation, the substrate is advanced in the machine direction so that a portion of the substrate passes through the linear field of view. The device may also be configured to perform various monitoring and / or management functions.
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