http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2017525156-A

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classificationCPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-405
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-30
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-45553
classificationIPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-40
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-316
filingDate 2015-08-11-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationDate 2017-08-31-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber JP-2017525156-A
titleOfInvention Group 6 film-forming composition for vapor deposition of Group 6 transition metal-containing films
abstract M (= O) (NR 2 ) 4 Formula I, M (= O) 2 (NR 2 ) 2 Formula II, and M (= NR) 2 (OR) 2 Formula III where M is Mo or W , and the and R are each independently, H, C1 -C6 alkyl group, or a SiR 'is 3, R' is group 6 is selected from the group consisting of a a) H, or C1 -C6 alkyl group A Group 6 film-forming composition is disclosed that includes a transition metal-containing precursor. Also disclosed is a method of synthesizing and using the disclosed composition to deposit a Group 6 transition metal-containing film on a substrate via a deposition process. [Selection] Figure 2
isCitedBy http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-7093853-B2
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priorityDate 2014-08-14-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

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