| abstract |
In the present invention, at least a substantially crystalline substrate surface (1o, 1o ′) of the substrate (1, 1 ′) is made amorphous by making the substrate surface (1o, 1o ′) amorphous. Further, the present invention relates to a method of performing surface treatment by forming an amorphous layer (2, 2 ′, 2 ″) with a thickness d> 0 nm of the amorphous layer (2, 2 ′, 2 ″). Furthermore, the invention relates to a corresponding device. |