http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2017222737-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_20d3042eb4ea7c9afd525aa89373349d |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08G8-20 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08G8-10 |
| filingDate | 2016-06-13-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_084df0f3d81c046a430db7c0038bafe2 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_87b99267f268944f21d923986e01fb50 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_e3843cb7eb38f1e6b53464a0e4ce044d |
| publicationDate | 2017-12-21-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-2017222737-A |
| titleOfInvention | Novolac resin and resist film |
| abstract | 【Task】 To provide a novolac resin having very high heat resistance and excellent developability, a photosensitive composition containing the resin, a curable composition, and a resist film. [Solution] It has a novolac resin structure in which the polyhydroxybenzene compound (A) and the aldehyde compound (B) are essential reaction raw materials, and part or all of the hydrogen atoms of the phenolic hydroxyl group in the resin are tertiary alkyl groups, A novolac resin substituted with any of an alkoxyalkyl group, an acyl group, an alkoxycarbonyl group, a heteroatom-containing cyclic hydrocarbon group, and a trialkylsilyl group. [Selection figure] None |
| priorityDate | 2016-06-13-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 585.