http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2017222612-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_d9cb217f83556ce2a418344c2d485415 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C07F15-06 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C07F15-04 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C07F19-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C07F7-10 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-18 |
| filingDate | 2016-06-16-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_2432d61ed037aae868d236dc965ebb8f |
| publicationDate | 2017-12-21-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-2017222612-A |
| titleOfInvention | Silyldiamine compound and organometallic compound having this as a ligand |
| abstract | An object of the present invention is to provide a novel organometallic compound that can be used for film formation mainly by a CVD method or an ALD method. The object of the present invention is solved by the silyldiamine compound of the present invention, a novel organometallic compound having this as a ligand, and a thin film forming material containing the organometallic compound. That is, the novel organometallic compound having the silyldiamine compound of the present invention as a ligand has volatility and can be suitably used as a semiconductor film forming material. [Selection figure] None |
| priorityDate | 2016-06-16-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 55.