http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2017207569-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_89afae566b725ae78e20cf972d9bcdc7 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-40 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-038 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-20 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-32 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 |
| filingDate | 2016-05-17-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_924d528c5928bf2714cb20455cbd5ab5 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_541897456bf4fb4ad455f0127b43c274 |
| publicationDate | 2017-11-24-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-2017207569-A |
| titleOfInvention | Resist pattern forming method |
| abstract | There is provided a resist pattern forming method capable of further miniaturization. SOLUTION: A step A for forming a resist prepattern 2 having a polar group exposed on a surface 2a on a support 1, a step B for bringing a polar solvent into contact with the resist prepattern 2, and a function acting on the polar group. A pattern-thickening polymer composition containing a polymer compound having a group is coated on a support 1 on which a resist prepattern 2 in contact with the polar solvent is formed so as to cover the resist prepattern 2 Then, the process C for forming the polymer film 3 and the process D for forming the developer insoluble layer 3a on the surface 2b of the resist prepattern 2 by causing the polar group and the functional group of the polymer compound to act. And developing the resist pre-pattern 2 having the developer-insoluble layer 3a formed on the surface and the polymer film 3 covering the resist pre-pattern 2 so that the resist pre-pattern 2 is thickened. And a step E of forming a chromatography emissions 4, a resist pattern forming method. [Selection] Figure 1 |
| priorityDate | 2016-05-17-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
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